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High
pressure apparatus: (a) cubic anvil type - Riken Kiki CAP-700 (<8GPa), and
(b) belt type - Toshiba Tungaloy (<8GPa)
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High
temperature X-ray diffractometer RIGAKU RINT-2100 (R.T.<1500oC)
Room
temperature X-ray diffractometer RIGAKU RINT-1000
Advanced thin film X-ray analysis system RINT (four-axis diffraction
machine)
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(a)
Superconducting
quantum interference device magnetometer: model Quantum Design MPMS2
(b) Physical property measurement system: model Quantum
Design PPMS6000
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Dilor
XY spectrometer with high sensitive CCD detector for Raman spectroscopy
(resolution=2cm-1, bandwith=400cm-1,
sensitivity=2count/min., dynamic range 40000)
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Self-Assembling
Epitaxy (SAE) thin film preparation system, and
RF
sputtering systems [for layer-by-layer deposition and/or conventional
deposition of thin films (vacuum up to 10-7torr)]
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Transport
properties [R(T); Jc transport] measuring system
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Optical
microscope with roughness and thickness measuring system
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Hot
isostatic press O2-Dr.HIP
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High
temperature furnace FD31 and other furnaces